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MIT OCW: 2.830J/6.780J/ESD.63J Control of Manufacturing Processes, Spring 2008

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Poster for MIT OCW: 2.830J/6.780J/ESD.63J Control of Manufacturing Processes, Spring 2008

About this film

This course explores statistical modeling and control in manufacturing processes. Topics include the use of experimental design and response surface modeling to understand manufacturing process physics, as well as defect and parametric yield modeling and optimization. Various forms of process control, including statistical process control, run by run and adaptive control, and real-time feedback control, are covered. Application contexts include semiconductor manufacturing, conventional metal and polymer processing, and emerging micro-nano manufacturing processes.

Directors & creators

Duane Boning, David Hardt

Subjects

Process control; manufacturing process; discrete system feedback control theory; empirical and adaptive modeling; off-line optimization; statistical process control; real-time control; 2.830J; 2.830; one-factor-at-a-time; robustness; Shewhart Hypothesis; semiconductor manufacturing

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